| 摘要 |
<P>PROBLEM TO BE SOLVED: To solve both of coping to complicated shapes and uniformity on an exposure surface which are defects in conventional technology in pattern formation by the proximity exposure of photosensitive resist. <P>SOLUTION: The proximity exposure apparatus has a system comprising an oxygen concentration meter built in the exposure apparatus, an oxygen gas supply system for supplying oxygen gas to the inside of the exposure apparatus and an nitrogen gas supply system for supplying nitrogen gas to the inside of the exposure apparatus and capable of feeding back the feeding amounts of the oxygen gas and the nitrogen gas so that a prescribed oxygen concentration is obtained by the measurement value of the oxygen concentration meter. <P>COPYRIGHT: (C)2007,JPO&INPIT |
