发明名称 |
Method and apparatus for deposition of films of coating materials, in particular of superconductive oxides |
摘要 |
There are provided herein a method and an apparatus for deposition of films of coating materials on a substrate, of particular use in obtaining superconductive composite tapes for deposition of films of superconductive oxides and/or buffer layers. A step of deposition of the film on the substrate is associated to a step of gas treatment in situ, in which a flow of gas is sent towards a working surface of the substrate or of the film growing on the substrate. The gas-treatment step is performed via ultrasound-expansion nozzles.
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申请公布号 |
US2007080053(A1) |
申请公布日期 |
2007.04.12 |
申请号 |
US20040571461 |
申请日期 |
2004.09.10 |
申请人 |
EDISON S.P.A. |
发明人 |
BALDINI ALBERTO;GAUZZI ANDREA;ZANNELLA SERGIO |
分类号 |
H05F3/00;C23C14/00;C23C14/24;C23C14/56;C23C14/58;H01L39/24 |
主分类号 |
H05F3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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