发明名称 Method and apparatus for deposition of films of coating materials, in particular of superconductive oxides
摘要 There are provided herein a method and an apparatus for deposition of films of coating materials on a substrate, of particular use in obtaining superconductive composite tapes for deposition of films of superconductive oxides and/or buffer layers. A step of deposition of the film on the substrate is associated to a step of gas treatment in situ, in which a flow of gas is sent towards a working surface of the substrate or of the film growing on the substrate. The gas-treatment step is performed via ultrasound-expansion nozzles.
申请公布号 US2007080053(A1) 申请公布日期 2007.04.12
申请号 US20040571461 申请日期 2004.09.10
申请人 EDISON S.P.A. 发明人 BALDINI ALBERTO;GAUZZI ANDREA;ZANNELLA SERGIO
分类号 H05F3/00;C23C14/00;C23C14/24;C23C14/56;C23C14/58;H01L39/24 主分类号 H05F3/00
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