| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve use efficiency of exposure light irradiating a strip-like photomask. <P>SOLUTION: The apparatus includes a stage 13 having an upper face 13a to mount a color filter substrate 11, a mask stage 6 placed above the stage and capable of holding a strip-like photomask 5 parallel to the upper face of the stage 13, and a light source 2 to irradiate the photomask 5 held by the mask stage 6 with exposure light, and functions to irradiate a color filter substrate 11 with exposure light emitting from the light source 2 through the photomask 5 to form a predetermined exposure pattern at a predetermined position. A cylindrical lens 14 to shape a cross-sectional form of the exposure light beam emitting from the light source 2 according to the shape of the strip-like photomask 5 is placed on the optical path between the light source 2 and the mask stage 6. <P>COPYRIGHT: (C)2007,JPO&INPIT |
