发明名称 NONVOLATILE MEMORY DEVICE AND FORMING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a nonvolatile memory device which provides a highly integrated memory device, and also to provide a forming method thereof. SOLUTION: A flash EEPROM array includes a first row of EEPROM cells having a first floating gate electrode 40, and a second row of EEPROM cells having a second floating gate electrode 40. The first floating gate electrode 40 includes a horizontal segment 40h and a vertical segment 40v which collectively define an L-shaped cross section of the first floating gate electrode 40 in a first direction. The second floating gate electrode 40 includes a horizontal segment 40h and a vertical segment 40v which collectively define the L-shaped cross section of the second floating gate electrode 40 in a second direction opposite to the first direction. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007073957(A) 申请公布日期 2007.03.22
申请号 JP20060234207 申请日期 2006.08.30
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 SAI TEIKAKU;LEE WOON-KYUNG;SONG JAI HYUK
分类号 H01L21/8247;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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