发明名称 |
NONVOLATILE MEMORY DEVICE AND FORMING METHOD THEREOF |
摘要 |
PROBLEM TO BE SOLVED: To provide a nonvolatile memory device which provides a highly integrated memory device, and also to provide a forming method thereof. SOLUTION: A flash EEPROM array includes a first row of EEPROM cells having a first floating gate electrode 40, and a second row of EEPROM cells having a second floating gate electrode 40. The first floating gate electrode 40 includes a horizontal segment 40h and a vertical segment 40v which collectively define an L-shaped cross section of the first floating gate electrode 40 in a first direction. The second floating gate electrode 40 includes a horizontal segment 40h and a vertical segment 40v which collectively define the L-shaped cross section of the second floating gate electrode 40 in a second direction opposite to the first direction. COPYRIGHT: (C)2007,JPO&INPIT
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申请公布号 |
JP2007073957(A) |
申请公布日期 |
2007.03.22 |
申请号 |
JP20060234207 |
申请日期 |
2006.08.30 |
申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
SAI TEIKAKU;LEE WOON-KYUNG;SONG JAI HYUK |
分类号 |
H01L21/8247;H01L27/115;H01L29/788;H01L29/792 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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