| 摘要 |
A method is described for setting up lithographic processing of a substrate. The lithographic processing uses a bottom anti-reflective coating for minimizing the substrate reflectivity. Such bottom anti-reflective coating typically is characterized by a set of selectable BARC parameters, such as the thickness, real refractive index, and/or absorption coefficient. The method includes selecting a set of values for the BARC parameters, determining the substrate reflectivity in the resist layer using the selected BARC parameter values, thereby taking into account the angles of incidence of the incident light rays, and evaluating whether or not the selected BARC parameter values result in a sufficiently low substrate reflectivity. Preferably, together with taking into account the angles of incidence of the incident light rays, the amplitude and/or the polarization state for light rays having a different angle of incidence are also taken into account.
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