Optical device and a microlithography projection exposure system with passive thermal compensation,申请号EP20050106797-传众专利搜索

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发明名称	Optical device and a microlithography projection exposure system with passive thermal compensation
摘要
申请公布号	EP1596235(B1)	申请公布日期	2007.02.28
申请号	EP20050106797	申请日期	1999.01.19
申请人	CARL ZEISS SMT AG	发明人	WAGNER, CHRISTIAN DR.;TRUNZ, MICHAEL;HILGERS, RALF
分类号	G02B7/00;H01L21/027;G02B7/02;G03F7/20	主分类号	G02B7/00
代理机构		代理人
主权项
地址

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