发明名称 |
Creating high voltage fets with low voltage process |
摘要 |
An integrated circuit (IC) includes a high voltage first-conductivity type field effect transistor (HV-first-conductivity FET) and a high voltage second-type field effect transistor (HV-second-conductivity FET). The HV first-conductivity FET has a second-conductivity-well and a field oxide formed over the second-conductivity-well to define an active area. A first-conductivity-well is formed in at least a portion of the active area, wherein the first-conductivity-well is formed to have the capability to operate as a first-conductivity-drift portion of the HV-first-conductivity FET. The HV second-conductivity FET has a first-conductivity-well and a field oxide formed over the first-conductivity-well to define an active area. A channel stop region I s formed in at least a portion of the active area, wherein the channel stop region is formed to have the capability to operate as second-conductivity-drift portions of the HV-second-conductivity FET.
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申请公布号 |
US2007010052(A1) |
申请公布日期 |
2007.01.11 |
申请号 |
US20050176033 |
申请日期 |
2005.07.06 |
申请人 |
HUANG CHIN;HINTZMAN JEFF;WEAVER JAMES;CHEN ZHIZHANG |
发明人 |
HUANG CHIN;HINTZMAN JEFF;WEAVER JAMES;CHEN ZHIZHANG |
分类号 |
H01L21/8238;H01L21/336 |
主分类号 |
H01L21/8238 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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