发明名称 Laser scanning apparatus and methods for thermal processing
摘要 Apparatus and methods for thermally processing a substrate with scanned laser radiation are disclosed. The apparatus includes a continuous radiation source and an optical system that forms an image on a substrate. The image is scanned relative to the substrate surface so that each point in the process region receives a pulse of radiation sufficient to thermally process the region.
申请公布号 US7154066(B2) 申请公布日期 2006.12.26
申请号 US20040787664 申请日期 2004.02.26
申请人 ULTRATECH, INC. 发明人 TALWAR SOMIT;MARKLE DAVID A.
分类号 B23K26/08;B23K26/00;B23K26/03;B23K26/04;B23K26/073 主分类号 B23K26/08
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