发明名称 MICROELECTROMECHANICAL STRUCTURE AND A METHOD FOR MAKING THE SAME
摘要 A microstructure and the method for making the same are disclosed herein. The microstructure has structural members, at least one of which comprises an intermetallic compound. In making such a microstructure, a sacrificial material is employed. After completion of forming the structural layers, the sacrificial material is removed by a spontaneous vapor phase chemical etchant.
申请公布号 US2006266730(A1) 申请公布日期 2006.11.30
申请号 US20040805610 申请日期 2004.03.18
申请人 DOAN JONATHAN;PATEL SATYADEV 发明人 DOAN JONATHAN;PATEL SATYADEV
分类号 B44C1/22;B81B7/00;B81C;B81C1/00;C23F1/00;H01L21/00;H01L21/76 主分类号 B44C1/22
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