发明名称 |
MICROELECTROMECHANICAL STRUCTURE AND A METHOD FOR MAKING THE SAME |
摘要 |
A microstructure and the method for making the same are disclosed herein. The microstructure has structural members, at least one of which comprises an intermetallic compound. In making such a microstructure, a sacrificial material is employed. After completion of forming the structural layers, the sacrificial material is removed by a spontaneous vapor phase chemical etchant.
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申请公布号 |
US2006266730(A1) |
申请公布日期 |
2006.11.30 |
申请号 |
US20040805610 |
申请日期 |
2004.03.18 |
申请人 |
DOAN JONATHAN;PATEL SATYADEV |
发明人 |
DOAN JONATHAN;PATEL SATYADEV |
分类号 |
B44C1/22;B81B7/00;B81C;B81C1/00;C23F1/00;H01L21/00;H01L21/76 |
主分类号 |
B44C1/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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