COMPOSITION FOR FORMING INTERMEDIATE LAYER CONTAINING SILYLPHENYLENE-BASED POLYMER AND PATTERN-FORMING METHOD

摘要

Provided is a composition for forming an intermediate layer disposed between a layer to be processed and a resist layer, which has improved etching resistance and anti-reflective property to light with a short wavelength. The composition for forming an intermediate layer comprises: (A) an aromatic ring-containing silylphenylene-based polymer having repeating units represented by the following formula 1; and (C) a solvent. In the formula 1, at least one of R1 and R2 is a crosslinkable group; each of m and n is an integer of 0-20; and l is a number of the repeating units. The silylphenylene-based polymer has a weight average molecular weight of 100-10000.