发明名称 SUBSTRATE PROCESSING EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To replace an L-type heater having a blown-out bulb, and to control the desired temperature distribution. SOLUTION: CVD equipment 10 comprises a plurality of L-type heaters 60 for heating a wafer, wherein the plurality of L-type heaters 60 are arranged to constitute three heating zones of an upper heating zone U, a center heating zone C, and a lower heating zone L. Distribution of the L-type heaters 60L<SB>1</SB>, 60L<SB>2</SB>in the lower heating zone L is set denser than that of the L-type heaters 60C in the center heating zone C; and overlap portions OR<SB>1</SB>and OR<SB>2</SB>are set, respectively, between the upper heating zone U and the center heating zone C, and between the center heating zone C and the lower heating zone L. Since the plurality of L-type heaters are independent from each other, they can be removed and replaced. Zone control of temperature distribution can be carried out by three heating zones. Occurrence of uneven temperature zone due to non-heat generating zone of the L-type heaters can be prevented by the overlap portions. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006319187(A) 申请公布日期 2006.11.24
申请号 JP20050141319 申请日期 2005.05.13
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 OKA TAKENORI;SHIMADA SHINICHI
分类号 H01L21/31;H01L21/22;H01L21/324 主分类号 H01L21/31
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