发明名称 |
Method of forming a thin layer and method of manufacturing a non-volatile semiconductor device using the same |
摘要 |
In a method of forming a thin layer having a desired composition, a source gas is provided onto a substrate loaded in a chamber for a first time, and the source gas is chemisorbed onto the substrate. While the source gas is provided, a plasma is generated in the chamber for a second time to change the chemisorbed source gas into the thin layer having the desired composition. The thin layer may have a stoichiometrical composition or a non-stoichiometrical composition.
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申请公布号 |
US2006246661(A1) |
申请公布日期 |
2006.11.02 |
申请号 |
US20060398217 |
申请日期 |
2006.04.05 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JOO KYONG-HEE;CHA YONG-WON;LIM SEUNG-HYUN;YEO IN-SEOK;NA KYU-TAE |
分类号 |
H01L21/336 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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