发明名称 MULTIVALUED RESISTIVE MEMORY ELEMENT, AND ITS MANUFACTURE AND OPERATING METHOD THEREFOR
摘要 <P>PROBLEM TO BE SOLVED: To provide a resistive memory element capable reducing driving voltage while enhancing density, and also capable of storing at least 2-bit data. <P>SOLUTION: The resistive memory element comprises a substrate, a transistor formed on the substrate, and a storage node coupled to the transistor, wherein the storage node comprises a lower electrode coupled to the substrate, a first phase change memory laminated on the lower electrode, a first barrier layer formed on the first phase change layer, a second change layer formed on the first barrier layer, and an upper electrode formed on the second phase change layer. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006295168(A) 申请公布日期 2006.10.26
申请号 JP20060104919 申请日期 2006.04.06
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 RI SHOKEN
分类号 H01L27/105;H01L45/00 主分类号 H01L27/105
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