发明名称 |
GLASS-BASED SEMICONDUCTOR ON INSULATOR STRUCTURES AND METHODS OF MAKING SAME |
摘要 |
<p>Methods and apparatus provide for: a semiconductor wafer; at least one porous layer in the semiconductor wafer; an epitaxial semiconductor layer directly or indirectly on the porous layer; and a glass substrate bonded to the epitaxial semiconductor layer via electrolysis.</p> |
申请公布号 |
WO2006112995(A2) |
申请公布日期 |
2006.10.26 |
申请号 |
WO2006US09410 |
申请日期 |
2006.03.15 |
申请人 |
CORNING INCORPORATED;GADKAREE, KISHOR, P. |
发明人 |
GADKAREE, KISHOR, P. |
分类号 |
H01L21/20;H01L21/36 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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