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发明名称
METHOD FOR TREATING SILICONE-BASED MATERIAL TO BE TREATED, TREATMENT APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要
申请公布号
KR20060105588(A)
申请公布日期
2006.10.11
申请号
KR20060028972
申请日期
2006.03.30
申请人
KABUSHIKI KAISHA TOSHIBA
发明人
YAMAUCHI TAKESHI
分类号
H01L21/205
主分类号
H01L21/205
代理机构
代理人
主权项
地址
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