Cleaning-drying apparatus and cleaning-drying method

摘要

It is an object to provide a semiconductor manufacturing apparatus provided with an apparatus performing a cleaning-drying process without a defect due to static electricity or the like, in a manufacturing process of a semiconductor device. One of features is that an ionizer included in a sheath is provided in a cleaning-drying apparatus. A structure in which an ionizer is covered with a sheath is used; accordingly, the ionizer can be operated without a concern of an electric leak due to an attachment of liquid. Also, static electricity generated in a cleaning-drying process can be removed.