发明名称 Nitride semiconductor light-emitting device, method of fabricating it, and semiconductor optical apparatus
摘要 A nitride semiconductor laser device has a nitride semiconductor substrate that includes a dislocation-concentrated region 102 and a wide low-dislocation region and that has the top surface thereof slanted at an angle in the range of 0.3° to 0.7° relative to the C plane and a nitride semiconductor layer laid on top thereof. The nitride semiconductor layer has a depression immediately above the dislocation-concentrated region, and has, in a region thereof other than the depression, a high-quality quantum well active layer with good flatness and without cracks, a layer that, as is grown, readily exhibits p-type conductivity, and a stripe-shaped laser light waveguide region. The laser light waveguide region is formed above the low-dislocation region. This helps realize a nitride semiconductor laser device that offers a longer life.
申请公布号 US2006202188(A1) 申请公布日期 2006.09.14
申请号 US20060435932 申请日期 2006.05.18
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 UETA YOSHIHIRO;TAKAKURA TERUYOSHI;KAMIKAWA TAKESHI;TSUDA YUHZOH;ITO SHIGETOSHI;YUASA TAKAYUKI;TANEYA MOTOTAKA;MOTOKI KENSAKU
分类号 H01L31/109;H01L29/06;H01L31/0328;H01L31/0336;H01L31/072;H01S5/00;H01S5/02;H01S5/22;H01S5/32;H01S5/343 主分类号 H01L31/109
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