| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask blank having a configuration that facilitate retardation adjustment and transmittance control in a translucent film. <P>SOLUTION: The translucent layered film 12 has a layered structure of a first translucent film 13 and a second translucent film 14, wherein the film thickness d and the refractive index n and the extinction coefficient to exposure light of each translucent film are designed in such a manner that one film acts as a phase advancing film while the other acts as a phase delay film. The film thickness d(<SP>+</SP>) (nm), refractive index n(<SP>+</SP>) and extinction coefficient k(<SP>+</SP>) of the phase advancing film, and the film thickness d(<SP>-</SP>) (nm), refractive index n(<SP>-</SP>) and extinction coefficient k(<SP>-</SP>) of the phase delay film are designed to satisfy k(<SP>+</SP>)>a<SB>1</SB>n(<SP>+</SP>)+b<SB>1</SB>in the phase advancing film, and k(<SP>-</SP>)<a<SB>2</SB>n(<SP>-</SP>)+b<SB>2</SB>in the phase delay film, wherein coefficients a and b are expressed by a<SB>1</SB>=0.113d(<SP>+</SP>)+0.774, b<SB>1</SB>=-0.116d(<SP>+</SP>)-0.281, a<SB>2</SB>=0.113d(<SP>-</SP>)+0.774, and b2=-0.116d(<SP>-</SP>)-0.281. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
