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发明名称
Schlamm für chemisch-mechanisches Polieren von Siliciumdioxid
摘要
申请公布号
DE60023635(T2)
申请公布日期
2006.07.20
申请号
DE20006023635T
申请日期
2000.12.04
申请人
EASTMAN KODAK CO.;CLARKSON UNIVERSITY;FERRO CORP.
发明人
SRINIVASAN, RAMANATHAN;BABU, SURYADEVARA V.;AMERICA, WILLIAM GEORGE;HER, YIE-SHEIN
分类号
B24B37/00;C09G1/02;C09K3/14;H01L21/304;H01L21/3105
主分类号
B24B37/00
代理机构
代理人
主权项
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