| 发明名称 |
Method for forming organic semiconductor layer and organic thin film transistor |
| 摘要 |
A method for forming an organic semiconductor layer especially for an organic thin film transistor in which a part of the organic semiconductive material thin film formed on a substrate is subjected to a pretreatment and then further subjected to a heating treatment.
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| 申请公布号 |
US2006145148(A1) |
申请公布日期 |
2006.07.06 |
| 申请号 |
US20050319286 |
申请日期 |
2005.12.28 |
| 申请人 |
HIRAI KATSURA;TANAKA TATSUO;TAKEMURA CHIYOKO;KATAKURA RIE;SUGISAKI REIKO |
发明人 |
HIRAI KATSURA;TANAKA TATSUO;TAKEMURA CHIYOKO;KATAKURA RIE;SUGISAKI REIKO |
| 分类号 |
H01L51/00;H01L51/40 |
主分类号 |
H01L51/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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