发明名称 Semiconductor device with semiconductor chip formed by using wide gap semiconductor as base material
摘要 A switching chip using silicon as the base material is located on the upper surface of a cooling mechanism formed of a heat sink, an insulating substrate and a conductive plate, with a first conductive layer sandwiched in between. Further, a diode chip having a smaller area than a cathode electrode and using a wide gap semiconductor as the base material is located on the cathode electrode which has a smaller area than an anode electrode, with a second conductive layer sandwiched in between. A closed container encloses every structural component except an exposed portion of a bottom surface in the interior space.
申请公布号 US7057298(B2) 申请公布日期 2006.06.06
申请号 US20040007246 申请日期 2004.12.09
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 HIRAO MASAYOSHI;SATOU KATSUMI;TOOI SHIGEO;MATSUO KAZUSHIGE
分类号 H01L23/02;H01L23/34;H01L21/52;H01L23/051;H01L23/36;H01L25/07;H01L25/18 主分类号 H01L23/02
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