| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic device provided with a structure for preventing the deformation of an article supported by an article support. <P>SOLUTION: The lithographic device includes an illuminating system adapted to provide a radiation beam, the article support adapted to support the article disposed in a beam path of the radiation beam, a multi-electrode clamp adapted to apply a clamping force for clamping the article against the article support, and a bias voltage circuit adapted to bias at least one electrode of the multi-electrode clamp so as to be able to avoid the formation of ridges appearing by electrostatic charge on the article. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
