首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
Method of Planarizing the Upper Surface of a Semiconductor Wafer
摘要
申请公布号
KR100571892(B1)
申请公布日期
2006.04.18
申请号
KR19997010006
申请日期
1999.10.29
申请人
发明人
分类号
H01L21/304
主分类号
H01L21/304
代理机构
代理人
主权项
地址
您可能感兴趣的专利
NEW ALCOHOL AND ITS PRODUCTION AND NEW ESTER AND PRODUCTION OF ROOTING INDUCTION SUBSTANCE OF CARROTS FROM NEW ALCOHOL
SETTING OF CABLE FOR MEASURING TEMPERATURE DISTRIBUTION
CONTROL METHOD FOR RESIN FLOW DISTRIBUTION OF RESIN TEMPERATURE ADJUSTING TYPE T DIE
CONTROL DEVICE FOR ON-VEHICLE AUTOMATIC TRANSMISSION
PREPARATION OF 1-CARBA(1-DETIA)-3-CEFEM-4-CARBOXYLIC ACID HAVING TWO PROTECTED SITES
STEERING WHEEL
MANUFACTURE OF LAMINATE
MANUFACTURE OF DECORATIVE SHEET
TARGET DISTANCE DETECTING DEVICE
FLUIDIC GAS METER
CONTROL DEVICE FOR TURBOCHARGER
OPERATION OF ELECTRIC FURNACE AND ELECTRIC FURNACE
SLIP RING FOR AUTOMOBILE
WATER-BASE PRINTING INK COMPOSITION FOR LAMINATE
PHOTOCURABLE FLUORORESIN COMPOSITION AND PRODUCTION OF VARNISH, PREPREG, AND LAMINATE THEREFROM
BOIL-UP CONTROLLER FOR ELECTRIC WATER HEATER
DOOR LOCK ASSEMBLY
PNEUMATIC TIRE
IRRADIATION CAPSULE UNSEALING DEVICE
CEMENT ADMIXTURE AND ITS QUICK-SETTING APPLICATION METHOD