发明名称 APPARATUS AND METHOD FOR TREATMENT OF METAL SURFACES BY INORGANIC ELECTROPHORETIC PASSIVATION
摘要 The present invention relates to an apparatus (100) and a process for electrolytically treating a metal surface. The apparatus includes an electrochemical cell (110) which includes an anodic chamber (112), a cathodic chamber (114), and a divider (116) separating the anodic chamber from the cathodic chamber. The anodic chamber has an anode and contains a conductive anodic medium (120). The cathodic chamber has, as a cathode (122), the metal surface to be treated, and contains a conductive cathodic medium (124) including a silica compound. In one embodiment, during operation of the apparatus, the anode remains substantially free of accumulation of foreign materials. In another embodiment, during operation of the apparatus, organic or inorganic compounds in the conductive cathodic medium remain substantially free of oxidation by the anode. In one embodiment, the treating comprises deposition of a silicon-containing mineral on the metal surface.
申请公布号 WO2005033371(A3) 申请公布日期 2006.04.06
申请号 WO2004US29599 申请日期 2004.09.13
申请人 ATOTECH DEUTSCHLAND GMBH;KOCHILLA, JOHN, R.;BISHOP, CRAIG, V.;STAPLES, WILLIAM, B.;OPASKAR, VINCENT, C. 发明人 KOCHILLA, JOHN, R.;BISHOP, CRAIG, V.;STAPLES, WILLIAM, B.;OPASKAR, VINCENT, C.
分类号 C25C7/00;C25D9/08;C25D13/02;C25D13/22;C25D17/00 主分类号 C25C7/00
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