| 摘要 |
The invention provides a semiconductor apparatus capable of achieving a device having a snap-back resisting pressure of about 5 to 10 V by a self-aligning process. The semiconductor apparatus includes two or more sub-gates placed next to a main gate at a predetermined interval, and low concentration layers placed continuously from the ends of source/drain layers to near the end of the main gate, having a potential type same as that of the source/drain layers, and having an impurity concentration lower than that of the source/drain layers.
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