| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a processing method by which printing durability and surface stain of a non-image area are improved even when a developer of ≤pH 12 is used, in a development processing method for a negative lithographic printing plate for near infrared laser exposure. <P>SOLUTION: In the development processing method for a negative photosensitive lithographic printing plate for a near infrared laser having a photosensitive layer containing a polymer having a polymerizable double bond in a side chain, a monomer or oligomer having two or more polymerizable double bonds per molecule, a photopolymerization initiator and a sensitizing dye having absorption in a wavelength region of ≥750 nm on an aluminum support subjected to silicate treatment after anodic oxidation, the developer contains a tetraalkylammonium hydroxide and has pH 10-12. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
