| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing niobium oxide thin film excellent in film deposition speed and for realizing satisfactory optical properties. SOLUTION: When niobium metal is used as a target and a niobium oxide thin film is deposited on the surface of a base material by a sputtering method, the amount of a reactive gas to be introduced is controlled by a plasma emission monitoring (PEM) method, and the strength of plasma generated from the niobium metal is controlled. Concretely, after the introduction of the reactive gas, the emission intensity of the plasma is controlled preferably within the range of 5 to 15% of the intensity of the plasma at the time of the start of the sputtering, by the amount of the reactive gas to be introduced. COPYRIGHT: (C)2006,JPO&NCIPI
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