发明名称 |
FABRICATION METHOD OF DISPLAY DEVICE |
摘要 |
<p>A method of fabricating a display device is provided. The method includes providing a substrate having a pixel region and a circuit region located at the periphery of the pixel region. A first semiconductor layer and a second semiconductor layer are formed on the pixel region and on the circuit region, respectively. The first semiconductor layer may be selectively surface treated to increase the density of lattice defects in a surface of the first semiconductor layer.</p> |
申请公布号 |
KR20060001716(A) |
申请公布日期 |
2006.01.06 |
申请号 |
KR20040050873 |
申请日期 |
2004.06.30 |
申请人 |
SAMSUNG SDI CO., LTD. |
发明人 |
HWANG, EUI HOON;KIM, DEUK JONG |
分类号 |
H01L29/786;H05B33/10 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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