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发明名称
METHOD FOR FORMING MULTI LAYER METAL LINE IN SEMICONDUCTOR DEVICE
摘要
申请公布号
KR20060000890(A)
申请公布日期
2006.01.06
申请号
KR20040049876
申请日期
2004.06.30
申请人
HYNIX SEMICONDUCTOR INC.
发明人
IM, SONG HYEUK
分类号
H01L21/3205
主分类号
H01L21/3205
代理机构
代理人
主权项
地址
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