EXPOSURE DEVICE, EXPOSURE DEVICE MEMBER CLEANING METHOD, EXPOSURE DEVICE MAINTENANCE METHOD, MAINTENANCE DEVICE, AND DEVICE MANUFACTURING METHOD

摘要

An exposure device EXS forms an immersion region AR2 of a liquid LQ on the image plane side of a projection optical system PL and performs exposure of a substrate P via the projection optical system PL and the liquid LQ of the immersion region AR2. The exposure device EXS has an optical cleaning device (80) which applies a predetermined irradiation light Lu having an optical cleaning effect for the upper surface (31) of the substrate stage PST in contact with the liquid LQ for forming the immersion region AR2. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy attributed to contamination of the member in contact with the liquid in the immersion region.