| 摘要 |
In step (401), a sub-set consisting of an arbitrary umber of shot areas is selected from a plurality of shot areas. In step (403), according to the design value of the position information relating to the shot areas contained in the sub-set and the information on a predetermined accuracy index associated with the position information, a most likelihood estimation value of the error parameter information is calculated for the arrangement on the wafer when the shot areas are made measurement shot areas. In step (405), according to the error parameter estimated, a superimposing error is calculated. In step (407), sub-sets having the superimposing error satisfying a predetermined condition are selected. Among the sub-sets selected, a sub- set having the most preferable moving sequence relating to the total movement time between the shot areas is selected.
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