ADAMANTANE DERIVATIVE, METHOD FOR PRODUCING SAME AND PHOTOSENSITIVE MATERIAL FOR PHOTORESIST

摘要

Disclosed is an adamantane derivative useful as a monomer for a functional resin such as a photoresist resin which is used as a photosensitive material for photoresists that is suitably used in fine processing, particularly in one using excimer laser light or electron beam. Also disclosed are a method for efficiently producing such an adamantane derivative and a photosensitive material for photoresists containing such an adamantane derivative and having the above-mentioned characteristics. Specifically disclosed is an adamantane derivative which is characterized by having a structure represented by the following general formula (I) (wherein R represents a hydrogen atom, a methyl group or a trifluoromethyl group; Y represents an alkyl group having 1-10 carbon atoms, a halogen atom or a hydroxyl group, or alternatively two Ys may combine together to form =O, and a plurality of Ys may be the same as or different from one another; k represents an integer of 0-15; m represents 0 or 1; and n represents an integer of 1-3). Also specifically disclosed are a method for producing an adamantane derivative represented by the above general formula (I) by reacting a haloalkyl adamantyl carboxylate with a (meth)acrylic acid or an acid anhydride thereof, and a photosensitive material for photoresists containing a polymer obtained from such an adamantane derivative.