发明名称 |
SUBSTRATE TREATMENT DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment device which can improve pressure withstanding property of the substrate constituting an image display device. SOLUTION: The substrate treatment device comprises a vacuum chamber 30 capable of housing a treatment object substrate 33; a treatment electrode 34 arranged capable of facing the treatment object substrate 33 in the vacuum chamber 30; an electric field impressing mechanism 35 which impresses the electric field to between the treatment object substrate 33 and the treatment electrode 34; a cleaning medium 41 installed capable of contacting the surface 34A of the treatment electrode; and a movement mechanism 42 which moves the cleaning medium 41 along the surface 34A of the treatment electrode. COPYRIGHT: (C)2006,JPO&NCIPI
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申请公布号 |
JP2005322514(A) |
申请公布日期 |
2005.11.17 |
申请号 |
JP20040139874 |
申请日期 |
2004.05.10 |
申请人 |
TOSHIBA CORP |
发明人 |
KOIDE SATORU;IZEKI YASUSHI |
分类号 |
H01J9/38;(IPC1-7):H01J9/38 |
主分类号 |
H01J9/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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