发明名称 SUBSTRATE TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate treatment device which can improve pressure withstanding property of the substrate constituting an image display device. SOLUTION: The substrate treatment device comprises a vacuum chamber 30 capable of housing a treatment object substrate 33; a treatment electrode 34 arranged capable of facing the treatment object substrate 33 in the vacuum chamber 30; an electric field impressing mechanism 35 which impresses the electric field to between the treatment object substrate 33 and the treatment electrode 34; a cleaning medium 41 installed capable of contacting the surface 34A of the treatment electrode; and a movement mechanism 42 which moves the cleaning medium 41 along the surface 34A of the treatment electrode. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005322514(A) 申请公布日期 2005.11.17
申请号 JP20040139874 申请日期 2004.05.10
申请人 TOSHIBA CORP 发明人 KOIDE SATORU;IZEKI YASUSHI
分类号 H01J9/38;(IPC1-7):H01J9/38 主分类号 H01J9/38
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