| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiosensitive resin composition superior in resolution and LEF resistance as a chemically amplified resist sensitive to a far ultraviolet ray, and a copolymer useful for the radiosensitive resin composition. <P>SOLUTION: This copolymer comprises a repeating unit obtained by copolymerizing a specific acrylic acid derivative as a monomer, a repeating unit obtained by using a specific hydroxy styrene derivative or obtained by using a compound that produces a hydroxy styrene derivative through hydrolysis as a monomer, and a repeating unit obtained by using a hydroxy styrene derivative as a monomer. The copolymer has a weight average molecular weight of 3,000-100,000 in terms of polystyrene as measured by gel permeation chromatography. The radiosensitive resin composition comprises the copolymer. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
