发明名称 Patterned grid element polarizer
摘要 The invention relates to a patterned grid polarizer for use in lithography, comprising a substrate that is transparent to ultraviolet (UV) light; and an array of elements patterned on the substrate, wherein the elements polarize UV light. The array of elements can be patterned to produce tangentially or radially polarized UV light.
申请公布号 US2005219696(A1) 申请公布日期 2005.10.06
申请号 US20040813168 申请日期 2004.03.31
申请人 ASML HOLDING N.V. 发明人 ALBERT MICHAEL M.;SEWELL HARRY
分类号 G02B5/30;G02B27/28;G03F7/20;H01L21/027;(IPC1-7):G02B5/30 主分类号 G02B5/30
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