发明名称 |
Patterned grid element polarizer |
摘要 |
The invention relates to a patterned grid polarizer for use in lithography, comprising a substrate that is transparent to ultraviolet (UV) light; and an array of elements patterned on the substrate, wherein the elements polarize UV light. The array of elements can be patterned to produce tangentially or radially polarized UV light.
|
申请公布号 |
US2005219696(A1) |
申请公布日期 |
2005.10.06 |
申请号 |
US20040813168 |
申请日期 |
2004.03.31 |
申请人 |
ASML HOLDING N.V. |
发明人 |
ALBERT MICHAEL M.;SEWELL HARRY |
分类号 |
G02B5/30;G02B27/28;G03F7/20;H01L21/027;(IPC1-7):G02B5/30 |
主分类号 |
G02B5/30 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|