| 摘要 |
A mask pattern correction method able to easily eliminate a fine step difference generated after line width correction of a pattern is provided. This is made a correction method of a mask pattern comprising a step of finding a difference between a graphic obtained by oversizing a pattern including a corner and temporary regions formed by shifting the pattern edge; a step of extracting an edge not contacting the line width corrected figure (region designation edge) from the difference; a step of forming a rectangle having the region designation edge as one side; and a step of deleting the rectangle from the difference to obtain a pattern burying the fine step difference. |
