发明名称 |
SEMICONDUCTOR MODULATOR ELEMENT AND ITS MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor modulator element and its manufacturing method which is manufacturable at a high yield even when a greatly warped substrate is used. SOLUTION: The semiconductor modulator element formed on a semiconductor substrate 1 having a diameter of 50 mm and a warp of 10μm or more is composed of a field effect transistor having a dual gate structure having a semiconductor-made channel 2, a source electrode 3 and a drain electrode 4 ohmically contacted with the channel 2, and a first and second gate electrodes 5, 6 formed on the channel 2. COPYRIGHT: (C)2005,JPO&NCIPI
|
申请公布号 |
JP2005243711(A) |
申请公布日期 |
2005.09.08 |
申请号 |
JP20040048175 |
申请日期 |
2004.02.24 |
申请人 |
NIPPON TELEGR & TELEPH CORP <NTT> |
发明人 |
SHIOJIMA KENJI;MAKIMURA TAKASHI;SHIGEKAWA NAOTERU;KOSUGI TOSHIHIKO |
分类号 |
H01L29/812;H01L21/338;H01L29/778;(IPC1-7):H01L21/338 |
主分类号 |
H01L29/812 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|