| 摘要 |
Disclosed is an exposure apparatus having a load-lock chamber being arranged to avoid condensation of water vapors in the load-lock chamber or to reduce the amount of condensation of the water vapors, with a simple structure and a simple control method. Specifically, an exposure apparatus according to an aspect of the present invention comprises an optical system being set at a reference temperature, for directing light to the substrate, an exposure chamber for storing the optical system in a vacuum ambience, and a load-lock chamber disposed adjacent the exposure chamber, for converting an ambience of a space surrounding the substrate into a vacuum ambience, wherein, when the load-lock chamber converts the ambience of the space surrounding the substrate into a vacuum ambience, the temperature of the load-lock chamber is made higher than the reference temperature.
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