| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of an electromagnetic wave shield material whereby a minute metallic pattern can be formed with high accuracy without the need for an etching process and excellent adhesion of the metallic pattern to a base member can be attained, and to provide the electromagnetic wave shield material provided with the minute and highly precise metallic pattern having excellent adhesion to the base member. SOLUTION: The manufacturing method of the electromagnetic wave shield material includes a step (a) of forming a region wherein a polymer having a functional group interacting with an electroless plating catalysis or its precursor is directly chemically bonded onto a transparent base member to visible light, a step (b) of providing the electroless plating catalysis or its precursor to the region, and a step (c) of applying electroless plating to the region to form a metallic pattern. The electromagnetic wave shield material is obtained by the manufacturing method above. COPYRIGHT: (C)2005,JPO&NCIPI
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