| 发明名称 |
Method and device for correcting pattern film on a semiconductor substrate |
| 摘要 |
In order to correct a white defect on a surface of a substrate, the substrate is held with the surface facing downward, laser light is upward irradiated at the defect on the surface in material gas, and as a result, the white defect is covered with film. |
| 申请公布号 |
US2005178752(A1) |
申请公布日期 |
2005.08.18 |
| 申请号 |
US20050098380 |
申请日期 |
2005.04.05 |
| 申请人 |
LASERFRONT TECHNOLOGIES, INC. |
发明人 |
MORISHIGE YUKIO;OOMIYA MAKOTO |
| 分类号 |
G02F1/13;C23C16/04;C23C16/44;C23C16/48;G03F1/00;G03F1/08;G03F1/72;G03F7/40;H01L21/027;(IPC1-7):B23K26/36 |
主分类号 |
G02F1/13 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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