发明名称 Semiconductor device and method for the fabrication thereof
摘要 Disclosed is a semiconductor device 10 comprising a first semiconductor element 11 with an arrangement of first element electrodes 12 , a second semiconductor element 13 with an arrangement of second element electrodes 14 , a connection member 15 electrically connecting together a portion 12 b of the first element electrodes 12 and the second element electrodes 14 , an insulation layer 17 covering a major surface 11 a of the first semiconductor element 11 and a backside surface 13 b of the second semiconductor element 13 , a wiring layer 22 formed on the insulation layer 17 and electrically connected to the first element electrode portion 12 b exposed in an opening portion 21 , and an external electrode 23 formed, as a portion of the wiring layer 22 , on the insulation layer 17.
申请公布号 US6924173(B2) 申请公布日期 2005.08.02
申请号 US20030387457 申请日期 2003.03.14
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 WATASE KAZUMI;FUJIMOTO HIROAKI;SAHARA RYUICHI;SHIMOISHIZAKA NOZOMI;KUMAKAWA TAKAHIRO;KAINO KAZUYUKI;NAKAMURA YOSHIFUMI
分类号 H01L25/18;H01L23/31;H01L23/48;H01L23/498;H01L25/065;H01L25/07;(IPC1-7):H01L21/58 主分类号 H01L25/18
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