| 摘要 |
PROBLEM TO BE SOLVED: To provide an alignment method for suppressing decrease in the registration of an incomplete unit region. SOLUTION: A wafer is prepared, in which a plurality of complete unit regions in which all regions are included in a surface to be treated on a substrate to be treated, and at least one incomplete unit region that is hung at the outer periphery of the substrate to be treated and is partially missing are demarcated. In at least one of the complete unit regions, alignment is made by die-by-die alignment, and position information is stored. Based on an estimation operation according to the stored position information, the incomplete unit region is aligned. By detecting a partial alignment mark formed in the incomplete unit region that has been aligned, position information at the incomplete unit region is obtained. Based on the obtained position information, the position correction of the incomplete unit region is made. COPYRIGHT: (C)2005,JPO&NCIPI
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