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发明名称
A RETICLE FOR DOUBLE EXPOSURE AND FABRICATING METHOD THEREOF
摘要
申请公布号
KR20050071807(A)
申请公布日期
2005.07.08
申请号
KR20040000128
申请日期
2004.01.02
申请人
HYNIX SEMICONDUCTOR INC.
发明人
HONG, JONG KYUN
分类号
H01L21/027;(IPC1-7):H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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