发明名称 SEMICONDUCTOR WAFER, MANUFACTURING METHOD THEREFOR AND MANUFACTURING METHOD OF SEMICONDUCTOR CHIP
摘要 PROBLEM TO BE SOLVED: To prevent bur, peeling and scattering of a metal thin film of a pad electrode when it is cut along the scribing region of a semiconductor chip. SOLUTION: At least three electrode pieces 5a, 5b and 5c are arranged in a widthwise direction of the scribing region 3 crossing a scribing direction as the pad electrodes 5. When an electric characteristic of a monitor element 4 is evaluated, a measuring probe can securely be brought into contact with the pad electrodes 5. When the semiconductor chip is divided into individual chips, a blade is made to abut on the center of the scribing region 3. Thus, the pad electrodes 5 (electrode pieces 5a and 5c) at the edge of the scribing region 3 can be cut without depressing them. Then, occurrence of bur, peeling and scattering of the metal thin film at the edge can be prevented. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005158832(A) 申请公布日期 2005.06.16
申请号 JP20030391533 申请日期 2003.11.21
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 MIKI KEIJI;UCHIUMI KATSUKI;MATSUSHIMA YOSHIHIRO
分类号 H01L23/52;H01L21/301;H01L21/3205;H01L21/822;H01L27/04;(IPC1-7):H01L21/301;H01L21/320 主分类号 H01L23/52
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