发明名称 |
ELECTRON BEAM DRAWING DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam drawing device provided with an objective lens and a simple structure having high temperature stability. SOLUTION: The electron beam drawing device includes a forming lens for forming an image of an electron beam to a forming aperture, a reduction lens for reducing the size of the formed electron beam image, and the objective lens for forming the electron beam image located on a board. The device is provided with a temperature control unit of a lens control board of the objective lens. The temperature control unit is configured such that a thermal insulation case surrounds the lens control board for controlling the objective lens, and a control element (Peltier element) provided to the thermal insulation case controls the temperature inside the thermal insulation case. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005150480(A) |
申请公布日期 |
2005.06.09 |
申请号 |
JP20030387304 |
申请日期 |
2003.11.18 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
SAKAMAKI MINORU;ANDO HIROZUMI |
分类号 |
H01J37/141;H01J37/16;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
H01J37/141 |
代理机构 |
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主权项 |
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地址 |
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