ALIGNER AND EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide aligner having a photoreceiver which excellently receives light via a projection optical-system. SOLUTION: The aligner exposes a substrate P by irradiating exposure light onto the substrate P disposed at an image surface side of a projection optical-system PL via the projection optical-system PL and liquid LQ, and has a photoreceiver 90 for receiving light that has passed through the projection optical-system PL via a slit plate 75 having a slit 71 disposed at the image surface side of the projection optical-system PL. The liquid LQ is filled between an optical element 76 forming the photoreceiver 90 and the slit plate 75. COPYRIGHT: (C)2005,JPO&NCIPI