| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas barrier film having high barrier properties in spite of reduced film thickness and not lowering gas barrier properties with respect to gas such as oxygen, steam or the like even under a much moisture condition, and its manufacturing method. SOLUTION: This gas barrier film has a base material film and a silicon oxide film formed on one side or both sides of the base material film by a plasma CVD method. The silicon oxide film has a component ratio wherein the number of oxygen atoms is 170-200 and the number of carbon atoms is 30 or below with respect to the number of silicon atoms of 100 and has an IR absorption based on Si-O-Si expansion and contraction vibration between wavelengths of 1055-1065 cm<SP>-1</SP>. At least one composite polymer layer wherein a main component comprises a straight chain polymer obtained by the polycondensation of a composition containing an alkoxysilane, a silane coupling agent and a polyvinyl alcohol by a sol-gel method is laminated on the silicon oxide film. COPYRIGHT: (C)2005,JPO&NCIPI
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