| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which can reduce the deposition of by-products between an exhausting means for exhausting a reaction chamber of air and a depollution apparatus and does not need maintenance so frequently. SOLUTION: The substrate processing apparatus is equipped with an exhausting system which comprises a first exhausting means 246, a second exhausting means 302, and the depollution apparatus 303. The first exhausting means 246, the second exhausting means 302, and the depollution apparatus 303 are arranged in this order from the upstream side. A second distance between the second exhausting means 302 and the depollution apparatus 303 is shorter than a first distance between the first exhausting means 246 and the second exhausting means 302. COPYRIGHT: (C)2005,JPO&NCIPI
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