MULTILAYERED FILM REFLECTION MIRROR, FILM-DEPOSITION METHOD OF REFLECTION MULTILAYERED FILM, FILM-DEPOSITION DEVICE AND EXPOSURE DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a multilayered film reflection mirror and the like having thin total film thickness, wherein higher reflectance can be obtained while surface roughness of a reflection multilayered film is reduced. SOLUTION: An Mo/Si multilayered film (a deep layer side multilayered film) 101 consisting of molybdenum and silicon is film-deposited on the surface of a substrate 103 by an ion beam sputtering method. An Mo/Si multilayered film (a surface side multilayered film) 102 is film-deposited on the surface of the deep layer side multilayered film 101 by a low voltage discharge rotary magnet cathode sputtering method which is a kind of a magnetron sputtering method. COPYRIGHT: (C)2005,JPO&NCIPI