发明名称 SUBSTRATE WASHING DEVICE AND WASHING METHOD
摘要 PROBLEM TO BE SOLVED: To improve mist eliminating efficiency, recovery efficiency of a washing solution, and regeneration efficiency of the washing solution. SOLUTION: This washing device is provided with a recovery part 6 having a recovery port 7 disposed at one end side of a substrate 3, and a blow out part 4 movable toward the one end side from the other end side of the substrate 3 while spraying the washing solution onto the surface of the substrate 3. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005095788(A) 申请公布日期 2005.04.14
申请号 JP20030333547 申请日期 2003.09.25
申请人 SEIKO EPSON CORP 发明人 UCHIYAMA KENJI
分类号 G02F1/13;B08B5/00;G02F1/1333;H01L21/304;(IPC1-7):B08B5/00;G02F1/133 主分类号 G02F1/13
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